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Type of photolithography
ordinary classical lithography. Quantum lithography is closely related to the fields of quantum imaging, quantum metrology, and quantum sensing. The effect
Quantum_lithography
Pakistani academic
in Quantum Optics. He is known for his contributions to quantum optics, quantum informatics, quantum entanglement, and sub-wavelength lithography. Zubairy
Suhail_Zubairy
Novel photolithoghaphic techniques
EUV include X-ray lithography, electron beam lithography, focused ion beam lithography, nanoimprint lithography, and quantum lithography. Several of these
Next-generation_lithography
Use of quantum correlations to image objects
quantum imaging are quantum ghost imaging, quantum lithography, imaging with undetected photons, sub-shot-noise imaging, and quantum sensing. Quantum
Quantum_imaging
Process in microfabrication
Photolithography (also known as optical lithography) is a process that involves using light to transfer a pattern onto a photoresist layer deposited on
Photolithography
Lithography using 13.5 nm UV light
Extreme ultraviolet lithography (EUVL or simply EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It
EUV_lithography
Application of quantum entanglement to high-precision measurement
(July 28, 2004). "Quantum lithography, entanglement and Heisenberg-limited parameter estimation" (PDF). Journal of Optics B: Quantum and Semiclassical
Quantum_metrology
Device measuring quantum mechanical effects
Within quantum technology, a quantum sensor utilizes quantum mechanical phenomena, such as quantum superposition, quantum entanglement, and quantum squeezing
Quantum_sensor
Method of fabricating nanometer scale patterns using a special stamp
Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput
Nanoimprint_lithography
Nano-scale semiconductor particles
Quantum dots (QDs) or semiconductor nanocrystals are semiconductor particles a few nanometres in size with optical and electronic properties that differ
Quantum_dot
Quantum computing implementation
quantum computing is a branch of quantum computing and solid-state physics that implements superconducting electronic circuits as qubits in a quantum
Superconducting quantum computing
Superconducting_quantum_computing
Used to create structures that only measure nanometers
rates which makes it a viable option for commercial purposes. Quantum optical lithography (QOL), is a diffraction-unlimited method able to write at 1 nm
Nanolithography
Technology with features near one nanometer
techniques of lithography, such as optical lithography, X-ray lithography, dip pen lithography, electron beam lithography or nanoimprint lithography offer top-down
Nanotechnology
Irish-American physicist (1955–2020)
quantum computing, quantum lithography, optical switching in photonic crystals, and the photonic band-edge laser. Dowling also researched the quantum
Jonathan_Dowling
timeline of quantum computing and communication. Erwin Schrödinger publishes a theorem setting the basis for quantum steering and the limits of quantum state
Timeline of quantum computing and communication
Timeline_of_quantum_computing_and_communication
Hexagonal lattice made of carbon atoms
monolayer graphene-hBN structures have been successfully synthesized via lithography patterning coupled with chemical vapor deposition (CVD). Furthermore
Graphene
Means of studying the interaction of light and matter
quantum regime. Modern fabrication techniques for superconducting qubits have evolved to include advanced methods such as electron beam lithography,
Circuit quantum electrodynamics
Circuit_quantum_electrodynamics
Quantum-mechanical many-body entangled state
group at JPL, who introduced them as the basis for the concept of quantum lithography. The term "NOON state" first appeared in print as a footnote in a
NOON_state
Force resulting from the quantisation of a field
In quantum field theory, the Casimir effect (or Casimir force) is a physical force acting on the macroscopic boundaries of a confined space which arises
Casimir_effect
Phenomenon resulting from the superposition of two waves
(acoustics) Coherence (physics) Diffraction Haidinger fringes Interference lithography Interference visibility Interferometer Lloyd's Mirror Moiré pattern Multipath
Wave_interference
Graphene nanoparticle with a size less than 100nm
Graphene quantum dots (GQDs) are graphene nanoparticles with a size less than 100 nm. Due to their exceptional properties such as low toxicity, stable
Graphene_quantum_dot
Type of cellular automaton
Quantum dot cellular automata (QDCA, sometimes referred to simply as quantum cellular automata, or QCA) are a proposed improvement on conventional computer
Quantum dot cellular automaton
Quantum_dot_cellular_automaton
Ratio of energy extracted from sunlight in solar cells
instead, including quantum efficiency, open-circuit voltage (VOC) ratio, and § Fill factor. Reflectance losses are accounted for by the quantum efficiency value
Solar-cell_efficiency
Photonics to control quantum states
integrated quantum photonics is Quantum technology:, for example quantum computing, quantum communication, quantum simulation, quantum walks and quantum metrology
Integrated_quantum_photonics
Dutch physicist (born 1972)
co-developers of quantum interferometric optical lithography. His research specializations include linear optical implementations of quantum communication
Pieter_Kok
Semiconductor manufacturing processes
indicates that SMIC is approaching "true 5 nm-equivalent node without EUV lithography." Transistor gate pitch is also referred to as CPP (contacted poly pitch)
5_nm_process
Award of the Jet Propulsion Laboratory
precise landing Dmitry Strekalov Quantum Lithography, and creating the quantum internet tested and the single-photon quantum optics technology capabilities
Lew_Allen_Award
Type of single-photon detector
infra-red photons. This is important because optical lithography rather than electron lithography can be used in their construction. This reduces the cost
Superconducting nanowire single-photon detector
Superconducting_nanowire_single-photon_detector
Elementary particle with negative charge
such as cathode ray tubes, electron microscopes, electron beam welding, lithography, and particle accelerators that generate synchrotron radiation. Electrons
Electron
Device that emits light via optical amplification
spot, enabling uses such as optical communication, laser cutting, and lithography. It also allows a laser beam to stay narrow over great distances (collimation)
Laser
Superconducting qubit implementation
In quantum computing, a charge qubit (also known as Cooper-pair box) is a qubit whose basis states are charge states (i.e. states which represent the
Charge_qubit
Predictions on future electronic developments
Lithography Metrology Emerging Research Materials Environment, Safety, Health, and Sustainability Yield Enhancement Cryogenic Electronics and Quantum
International Roadmap for Devices and Systems
International_Roadmap_for_Devices_and_Systems
Observation on the growth of integrated circuit capacity
generation of chips. The cost of the tools, principally extreme ultraviolet lithography (EUVL), used to manufacture chips doubles every 4 years. Rising manufacturing
Moore's_law
Inorganic compound
as a negative resist in photolithography and electron-beam (e-beam) lithography. HSQ is commonly delivered in methyl isobutyl ketone (MIBK) and can be
Hydrogen_silsesquioxane
Superconducting circuit element
SQUIDs, in classical logic gates for ultrafast computing, and in circuit quantum electrodynamics to create superconducting qubits. In 1962, British physicist
Josephson_junction
American physicist, academic and researcher (1944–2024)
peer-reviewed research papers and holds six patents in the fields of lithography and laser processing. His graduate textbook, Electromagnetic Radiation
Richard_R._Freeman
Overview of and topical guide to nanotechnology
Nanolithography – Electron beam lithography – Ion-beam sculpting – Nanoimprint lithography – Photolithography – Scanning probe lithography – Molecular self-assembly
Outline_of_nanotechnology
optics) (waves) Additive genetic effects (genetics) Aharonov–Bohm effect (quantum mechanics) Al Jazeera effect (Al Jazeera) (media issues) Alienation effect
List_of_effects
American entrepreneur and venture capitalist (born 1967)
hopes to add others, among which a plan for onshoring ultraviolet light lithography. Business Insider reports that, among Thiel's inner circle (who know
Peter_Thiel
Laser technology
sample with Electron beam lithography and processing the pillars with reactive ion etching. Tunable micro-cavities hosting quantum dots can be also used as
Quantum dot single-photon source
Quantum_dot_single-photon_source
Light-sensitive material used in making electronics
designed part (could be used as both positive or negative photoresist). In lithography, decreasing the wavelength of light source is the most efficient way
Photoresist
Superconducting qubit implementation
In quantum computing, more specifically in superconducting quantum computing, flux qubits (also known as persistent current qubits) are micrometer sized
Flux_qubit
Wire with a diameter in the nanometres
unconstrained length. At these scales, quantum mechanical effects are important—which coined the term "quantum wires". Many different types of nanowires
Nanowire
Type of ultraviolet laser important in chip manufacturing and eye surgery
ultraviolet lithography (EUV) has started to replace excimer laser lithography to further improve the resolution of the semiconductor circuits lithography process
Excimer_laser
Simultaneous absorption of two photons by a molecule
more sensitive resins/resists, two-photon absorption found its way into lithography. One of the most distinguishing features of two-photon absorption is
Two-photon_absorption
Response if an optical system to a point source of light
determination of PSF requires sub-resolution (point-like) radiating sources. Quantum dots and fluorescent beads are usually considered for this purpose. Theoretical
Point_spread_function
Academic journal
and Information Optics Quantum Electronics Photonics Biophotonics Displays Quantum Optics and Quantum Information Lithography/Optical Materials Optica
Current_Optics_and_Photonics
Type of gas laser
lasers are used for retinal phototherapy (for the treatment of diabetes), lithography, and the pumping of other lasers. Argon-ion lasers emit at 13 wavelengths
Ion_laser
Advanced lithographic node used in volume CMOS semiconductor fabrication
sizes may be drawn as 65 nm or less, the wavelengths of light used for lithography are 193 nm and 248 nm. Fabrication of sub-wavelength features requires
65_nm_process
Chemical compound
InGaN/GaN nanorod light emitting diode arrays fabricated by nanosphere lithography and chemical mechanical polishing processes". Optics Express. 18 (8):
Indium_gallium_nitride
Term in mesoscopic physics
range of dimensions is routinely reached for example by electron beam lithography and appropriate pattern transfer technologies, like the Niemeyer–Dolan
Coulomb_blockade
Theoretical model describing interacting fermions in a one-dimensional conductor
(lithography, AFM, etc.) electrons in carbon nanotubes electrons moving along edge states in the fractional quantum Hall effect or integer quantum Hall
Luttinger_liquid
MOS field-effect transistor with more than one gate
gating High-κ dielectric Next-generation lithography Extreme ultraviolet lithography Immersion lithography Strain engineering Very large scale integration
Multigate_device
Cleaning method using gas
polyethylene (Spectra) fibers and aramid fibers Plasma Lithography for nanoscale surface structures and quantum dots Micropatterning of thin films The unique characteristics
Plasma_cleaning
top of the film. This process uses a laser technique called two-photon lithography to etch out a polymer into a three-dimensional structure. The laser hardens
Ceramic_nanoparticle
Quartz substrate of an integrated waveguide optical power distribution device
better solution for larger applications. Waveguides are fabricated using lithography onto a silica glass substrate, which allows for routing specific percentages
Fiber-optic_splitter
Optical component which splits light into several beams
several interfaces of an optical waveguide planar by using standard micro-lithography or nano-imprinting methods, compatible with mass-production. Light propagates
Diffraction_grating
Semiconductor manufacturing process
2024, a team led by Director Jo Moon-Ho at the Center for Van der Waals Quantum Solids within the Institute for Basic Science (IBS) in South Korea developed
1_nm_process
American painter, printmaker, tapestry innovator, educator and activist
She founded Tamarind Lithography Workshop (1960–1970), a then California-based nonprofit print shop dedicated to lithography. Wayne was born in Chicago
June_Wayne
fabricated using standard microfabrication techniques lithography and etching. Variety of lithography and etching techniques can be implemented to SAE mask
Selective_area_epitaxy
Bengali American physicist (born 1931)
Institute of Technology Kharagpur when he received his Ph.D. degree in quantum physics in 1958. His thesis was on Resonant Electronic Energy Transfers
Mani_Lal_Bhaumik
San Francisco-based venture capital firm
Positron AI. Substrate: founded by James Proud , the startup develops X-ray lithography (instead of the EUV method) for chip production. In October 2025, Substrate
Founders_Fund
American physicist (born 1965)
spin in semiconductor heterostructure. Development of conductive-AFM lithography for extreme nanoscale control of the metal-insulator transition in LaAlO3/SrTiO3
Jeremy_Levy
Taiwanese semiconductor foundry company
capabilities, and the first to commercialise ASML's extreme ultraviolet (EUV) lithography technology in high volume. In 1986, Li Kwoh-ting, representing the Executive
TSMC
Laser that uses surface plasmon polaritons
Spasers could find a wide range of applications, including nanoscale lithography, fabrication of ultra-fast photonic nano circuits, single-molecule biochemical
Spaser
Electronic component
beam (e-beam) lithography. This process is slow and relatively expensive because parallel processing is not possible with e-beam lithography. Typically,
Optical_rectenna
Periodic structure of layers of two or more materials
lithography used for the patterning of the heterostructure surface). Energies are correspondingly smaller in superlattices. Using the simple quantum-mechanically
Superlattice
Type of transmissive optical device
technologies such as evanescent near-field lithography, near-field interference lithography, and phase-shifting mask lithography were developed to overcome the diffraction
Superlens
valence of three or more. Dip Pen Nanolithography An AFM-based soft-lithography technique. Directed-Assembler A specific type of assembler that makes
Glossary_of_nanotechnology
Near-field diffraction effect
capacity to generate very fine patterns is also a powerful tool in Talbot lithography. The Talbot cavity is used for the phase-locking of the laser sets. In
Talbot_effect
Combination of chemistry and nanoscience
or lithography. Nanodiamonds allow for greater variability in access that can subsequently be used to couple plasmonic waveguides to realize quantum plasmonic
Nanochemistry
History of semiconductor light source
efficiency. Sapphire substrate patterning can be carried out with nanoimprint lithography. GaN-on-Si is difficult but desirable since it takes advantage of existing
History_of_the_LED
American artist
printmaker and educator. He was one of the co-founders of the Tamarind Lithography Workshop in Los Angeles, California. Antreasian was born on February
Garo_Antreasian
Research and scientific development company
collaborators. Also in 1994, Peter Shor devised his quantum factorization algorithm. In 1996, SCALPEL electron lithography, which prints features atoms wide on microchips
Bell_Labs
Measurement standards laboratory in the United States
measurement and characterization of systems for extreme ultraviolet lithography. The Center for Nanoscale Science and Technology (CNST) performs research
National Institute of Standards and Technology
National_Institute_of_Standards_and_Technology
Japanese computer scientist
an initial configuration with only one active cell. In electron beam lithography, Goto's work included the development of double deflection tubes and
Eiichi_Goto
Semiconductor foundry company
planned to initially use deep ultraviolet lithography, and eventually transition to extreme ultraviolet lithography. However, in August 2018, GlobalFoundries
GlobalFoundries
Device used to produce electricity from light
Schwarzkopf, S.; Muller, C.; Hermle, M.; Blasi, B. (2011). "Nanoimprint Lithography for Honeycomb Texturing of Multicrystalline Silicon". Energy Procedia
Solar_cell
Indian-American physicist
Illinois Urbana-Champaign. Her research considers the spin and charge of quantum materials. She combines high resolution characterization techniques with
Vidya_Madhavan
condensation." His group at WSU performs a variety of experiments involving quantum hydrodynamics, spin–orbit coupling (See Spin–orbit interaction), soliton
Peter_Engels
Quantapoint Quantum amplifier Quantum cascade laser Quantum clock Quantum defect Quantum dot Quantum dot laser Quantum heterostructure Quantum imaging Quantum limit
List_of_laser_articles
High-energy detection
(structure) scintillators as they can be patterned through nanoimprinting lithography while some perovskite materials with high refractive index already demonstrated
Nanophotonic_scintillators
Tunneling diode
differential resistance regions. All types of tunneling diodes make use of quantum mechanical tunneling. Characteristic to the current–voltage relationship
Resonant-tunneling_diode
Type of laser diode
A distributed-feedback laser (DFB) is a type of laser diode, quantum-cascade laser or optical-fiber laser where the active region of the device contains
Distributed-feedback_laser
Method of imaging magnetic fields at microscopic scales
physics, scanning SQUID microscopy is a technique where a superconducting quantum interference device (SQUID) is used to image surface magnetic field strength
Scanning_SQUID_microscopy
IEEE award
University Nanoimprint lithography and nanodevices 2015 Chennupati Jagadish Australian National University Semiconductor nanowire and quantum dot optoelectronics
Pioneer Award in Nanotechnology
Pioneer_Award_in_Nanotechnology
Pillar-shaped nanostructure
efficient way to create nanopillars. They used a combination of nanosphere lithography (a way of organizing the lattice) and reactive ion etching(molding the
Nanopillar
Device used to focus light using diffraction
make your zones. Zone plates are frequently manufactured using lithography. As lithography technology improves and the size of features that can be manufactured
Zone_plate
United States legislation promoting the semiconductor industry and public basic research
sector research in science and technology, advancing human spaceflight, quantum computing, materials science, biotechnology, experimental physics, research
CHIPS_and_Science_Act
relative humidity of the atmosphere. The development of nanometer-scale lithographies is the focus of an intense research activity because progress on nanotechnology
Local oxidation nanolithography
Local_oxidation_nanolithography
Periodic optical nanostructure that affects the motion of photons
visible range photonic crystals by Sato et al. in 2002, uses electron-beam lithography and dry etching: lithographically formed layers of periodic grooves are
Photonic_crystal
American physicist (1946–2014)
than his theoretical pursuits, Tucker initiated atom-scale STM e-beam Lithography (as based on selective desorption of hydrogen from H-passivated silicon
J._R._Tucker
German machine tools and laser manufacturer
the production of modern microchips using EUV (extreme ultraviolet) lithography. This achievement was the result of a partnership with ASML, Zeiss, and
Trumpf
Extremely small sensors
several ways proposed today to make nanosensors; these include top-down lithography, bottom-up assembly, and molecular self-assembly. There are different
Nanosensor
American physicist
al., "Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic," IEEE Journal of Quantum Electronics, vol. 42, no
Keith_Jackson_(physicist)
Nanoelectronics conference
President/Chief Technical Officer of ASML N.V., discussed the importance of EUV lithography, and Kazu Ishimaru, Senior Fellow at Kioxia, discussed the future of
International Electron Devices Meeting
International_Electron_Devices_Meeting
Optical lens
bi-telecentric lenses with many optical elements are commonly used in optical lithography (that copies a template of an electrical circuit to print or fabricate
Telecentric_lens
Research institute in Jena, Germany
(CMN-Optics). The core of the facility is the SB350-OS electron beam lithography system. This device, also known as an "electron beam recorder", allows
Fraunhofer Institute for Applied Optics and Precision Engineering
Fraunhofer_Institute_for_Applied_Optics_and_Precision_Engineering
Imaging Instrument
environments, and for temperatures over 1000 °C. STM is based on the concept of quantum tunneling. When the tip is brought very near to the surface to be examined
Scanning_tunneling_microscope
Optical Cavity
fabricated using combinations of thin-film growth, electron-beam or optical lithography, dry etching, wet etching, deposition, oxidation and wafer bonding. Suspended
Nanophotonic_resonator
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