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Photolithographic tool
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are
Photomask
Japanese optical products company
Kabushiki-gaisha) is a Japanese company manufacturing optical products such as photomasks, photomask blanks and hard disk drive platters, contact lenses and eyeglass
Hoya_Corporation
Process in microfabrication
the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone through the photomask, exposing the photoresist
Photolithography
German mechanical engineering company
components. The company offers products for the processing of lithographic photomasks and the advanced backend of the semiconductor value chain. It serves as
Suss_Microtec
A mask shop is a factory which manufactures photomasks for use in the semiconductor industry. There are two distinct types found in the trade. Captive
Mask_shop
American photomask manufacturer
Inc. is an American photomask manufacturer for integrated circuits and flat-panel displays. It was the third largest photomask supplier globally as of
Photronics
Lithography using 13.5 nm UV light
laser-pulsed tin droplet plasma to produce a pattern by using a reflective photomask to expose a substrate covered by photoresist. Tin ions in the ionic states
EUV_lithography
Lithographic technique that uses a scanning beam of electrons
lithography has high resolution but low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research
Electron-beam_lithography
Aligns a photomask with features on a wafer
integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask
Aligner_(semiconductor)
Final stage of the design of electronic circuits before fabrication
manufacturing. The tapeout is specifically the point at which the graphic for the photomask of the circuit is sent to the fabrication facility. The name originates
Tape-out
Step in Photomask Fabrication
polygons from an integrated-circuit layout into set of instructions that a photomask writer can use to generate a physical mask. Typically, amendments and
Mask_data_preparation
microtechnology, mask inspection or photomask inspection is an operation of checking the correctness of the fabricated photomasks, used, e.g., for semiconductor
Mask_inspection
Photomask enhancement technique
optimize photomask design. It is basically an approach to solve an inverse imaging problem: to calculate the shapes of the openings in a photomask ("source")
Inverse_lithography
Resolution-improving photomask
Phase-shift masks are photomasks that take advantage of the interference generated by phase differences to improve image resolution in photolithography
Phase-shift_mask
Semiconductor company
systems that analyze and repair defects on photomasks and measure and optimize defined mask properties. The photomask contains all the structure information
Carl_Zeiss_SMT
Lithography that does not use photomasks
Maskless lithography (MPL) is a photomask-less photolithography-like technology used to project or focal-spot write the image pattern onto a chemical
Maskless_lithography
Optical system setup in photolithography
illumination is an optical system setup in which the incoming light strikes a photomask at an oblique angle rather than perpendicularly to it, that is to say
Off-axis_illumination
Taiwanese and American businessman (born 1963)
began learning Mandarin Chinese in order to communicate with Chinese photomask workers employed at the company. He has said that he learned the language
Jensen_Huang
Type of distributed Bragg reflector constructed in a short segment of optical fiber
the hardware. A photomask having the intended grating features may also be used in the manufacture of fiber Bragg gratings. The photomask is placed between
Fiber_Bragg_grating
Chemical element with atomic number 44 (Ru)
application of ruthenium is as the capping layer for extreme ultraviolet photomasks in semiconductor lithography. Ruthenium is generally found in ores with
Ruthenium
American electronics company
divisions. Jim Piker founded and managed Mostek's in-house Photomask operations. The photomask step and repeat techniques eventually were copied for wafer
Mostek
File format used for photomask production
is a binary file format used for specification of data structures for photomask production. It's used to represent a pattern an interchange and encapsulation
Open Artwork System Interchange Standard
Open_Artwork_System_Interchange_Standard
Lithography technique
photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist
Contact_lithography
Japanese chemical company
global market share for polyvinyl chloride, semiconductor silicon, and photomask substrates. “Shin-Etsu” in the company's name derives from Shin'etsu Region
Shin-Etsu_Chemical
a modification on the evanescent near-field lithography, uses a metal photomask, on which the SPPs are excited. Similar to common photolithographic processes
Plasmonic_nanolithography
Electronic computer-aided design software
that control the fabrication of photomasks used to manufacture the designed IC. CATS software tools generate photomask layers from input design layers
CATS_(software)
Manufacturing process used to create integrated circuits
costly since 1978. In 1984, KLA developed the first automatic reticle and photomask inspection tool. In 1985, KLA developed an automatic inspection tool for
Semiconductor device fabrication
Semiconductor_device_fabrication
Photolithography enhancement technique
designed, these are amenable to compensation by changing the pattern on the photomask used for imaging. Other distortions such as rounded corners are driven
Optical_proximity_correction
American technology company
Instruments was founded in 1975 by Ken Levy and Bob Anderson, and focused on photomask detection to identify chip defects. KLA later broadened its product line
KLA_Corporation
circuits are made in a similar fashion utilizing photomasks with sub-micrometer feature sizes; photomasks are traditionally made by photoreducing photoplotter
Photoplotter
coordinatograph was a machine that precisely placed and cut rubylith to create photomasks for early integrated circuits, including some of the earliest generations
Coordinatograph
Statements left on the Moon in 1969 by the Apollo 11 astronauts
Corp in Burlington MA which used a reduction camera to make a negative photomask containing all the letters plus an inscription around its edge at its
Apollo_11_goodwill_messages
Vacuum tube used to display images
color purity. Removable shadow masks with spring-loaded clips are used as photomasks. The process is repeated with all colors. Usually the green phosphor is
Cathode_ray_tube
Design and fabrication of semiconductors
may or may not offer design services to third parties, as well as mask (photomask) making, semiconductor packaging and testing services, which can also
Semiconductor_industry
American semiconductor designing company
mask making and CEBL". In Faure, Thomas B.; Ackmann, Paul W. (eds.). Photomask Technology 2013. Vol. 8880. SPIE. pp. 124–130. doi:10.1117/12.2030684
Multibeam_Corporation
Database file format for data exchange of integrated circuit layout artwork
different tools, or creating photomasks. Initially, GDSII was designed as a stream format used to control integrated circuit photomask plotting. Despite its
GDSII
Technique for patterning photomasks
arrays of fine features without the use of complex optical systems or photomasks. The basic principle is the same as in interferometry or holography. An
Interference_lithography
Japanese printing company
wave shield mesh for plasma displays Semiconductors: photomasks for semiconductors (Tekscend Photomasks), design services for LSI, device OEM, leadframes
Toppan
Electronic circuit formed on a small, flat piece of semiconductor material
copying by photographing each layer of an integrated circuit and preparing photomasks for its production on the basis of the photographs obtained is a reason
Integrated_circuit
Material of moderate electrical conductivity
used as a gate insulator and field oxide. Other processes are called photomasks and photolithography. This process is what creates the patterns on the
Semiconductor
Founder of Lam Research Corporation
required photomasks become very expensive. CEBL systems can be incorporated into existing optical lines to reduce the number of expensive photomasks required
David_K._Lam
Machine capable of carrying out a complex series of actions automatically
perform non-repetitive and non-sequential tasks such as transporting photomasks in a semiconductor lab, specimens in hospitals and goods in warehouses
Robot
Display that uses the light-modulating properties of liquid crystals
black resist has been dried in an oven and exposed to UV light through a photomask, the unexposed areas are washed away, creating a black grid. Then the
Liquid-crystal_display
Process of making liquid crystal display (LCD) panels
are made using photolithography techniques, which involve using photomasks. The photomask(s) are used to create TFTs on a substrate, which involves formation
LCD_manufacturing
Algorithmic approaches to improving resolution in photolithography
diffraction optics to specify multi-layer phase-shift photomasks that use interference patterns in the photomask that enhance resolution on the printed wafer surface
Computational_lithography
Aim markings in optical devices, e.g. crosshairs
Adrien Auzout Deflection (ballistics) List of astronomical instruments Photomask – partial plate with holes or transparencies used in photolithography
Reticle
Step in the design cycle of devices
fabrication, the manufacturing process whereby designs are transferred via photomasks onto silicon dies which are then packaged into ICs. Each of the phases
Physical_design_(electronics)
Japanese manufacturing company
Filcon Headquarters Type Corporation TYO: 5942 Industry Paper Headquarters Tokyo , Japan Products Mesh, Photomask Website www.filcon.co.jp/index.html/
Nippon_Filcon
Use of 3D printing for micro-fabrication
technology provides dynamic stereolithography masks that work as a virtual photomask. This technique allows for rapid photopolymerization of an entire layer
Projection micro-stereolithography
Projection_micro-stereolithography
Integrated circuit customized for a specific task
optimal" solution. The output is a file which can be used to create a set of photomasks enabling a semiconductor fabrication facility, commonly called a "fab"
Application-specific integrated circuit
Application-specific_integrated_circuit
Type of electronics manufacturing
inspection, and others) Initially PCBs were designed manually by creating a photomask on a clear mylar sheet, usually at two or four times the true size. Starting
Printed circuit board manufacturing
Printed_circuit_board_manufacturing
Software for designing electronic systems
Mask data preparation or MDP - The generation of actual lithography photomasks, utilised to physically manufacture the chip. Chip finishing which includes
Electronic_design_automation
Capital city of Saxony, Germany
fabrication spin-off GlobalFoundries, Infineon Technologies, ZMDI and Toppan Photomasks. Their factories attract many suppliers of material and cleanroom technology
Dresden
Box carrying semiconductor wafers in its own internal atmosphere
semiconductor fabrication environment. Used in lithographic tools, reticles or photomasks contain the image that is exposed on a coated wafer in one processing
SMIF_(interface)
Part of photolithography of integrated circuits
Resolution enhancement technologies are methods used to modify the photomasks in the lithographic processes used to make integrated circuits (ICs or "chips")
Resolution enhancement technologies
Resolution_enhancement_technologies
Photolithographic Tool
and opaque areas on the surface of a glass or plastic plate called a photomask or reticle. The wafer is coated with a photosensitive material called
Stepper
Procedure for fabricating semiconductors
computer aided design. This is necessary for the layers to be defined for photomask production. The resolution of the circuits increases rapidly with each
Wafer_fabrication
City in Texas, United States
Supply, Sears Customer Care, Texas Guaranteed Student Loan Corp, Tekscend Photomask, and TECO-Westinghouse. Dell, a multinational computer and information
Round_Rock,_Texas
Form of non-volatile memory used in computers and other electronic devices
layout and predictable propagation delay. Mask ROM is programmed with photomasks in photolithography during semiconductor manufacturing. The mask defines
Read-only_memory
Formation of a thioether (–S–) compound from a thiol (–SH) and an alkene ( >C=C< )
thiol or alkene can be controlled spatially through photomasking. More specifically, a photomask, enables the selective exposure of a surface to a UV
Thiol-ene_reaction
IP protections for computer hardware
etched layers within actual ICs are each created using a mask, called the photomask, to permit or block light at specific locations, sometimes for hundreds
Integrated circuit layout design protection
Integrated_circuit_layout_design_protection
Optical machine-readable representation of data
24778 Bokode A Data Matrix code in which the code is stored on a small photomask and backlit. When viewed with a camera focused to infinity, the code is
Barcode
Early type of solid state computer memory
lead time to make, since the artwork or design in an IC mask layer or photomask must be altered to store data on the ROMs. Initially, it was thought that
EPROM
Data tags that are read out of focus
of 3 millimetres (0.12 in). A bokode consists of an LED covered with a photomask and a lens. Powered bokodes are relatively expensive because of the LED
Bokode
structure inside a package that connects the chip to its leads mask – see photomask MCM – see multi-chip module microbump – a very small solder ball that
Glossary of microelectronics manufacturing terms
Glossary_of_microelectronics_manufacturing_terms
Scanning probe lithographic technique
include such work as ultra-high-density biological nanoarrays and additive photomask repair. The uncontrollable transfer of a molecular "ink" from a coated
Dip-pen_nanolithography
Semiconductor foundry company
supply agreement with Toppan Photomasks. The agreement included Toppan acquiring GlobalFoundries' Burlington photomask facility. In February 2020 GlobalFoundries
GlobalFoundries
like traditional black and white photography, or through the use of a photomask (Type 2) and chemical etching, color addition, or color subtraction. Type
Photosensitive anodized aluminum
Photosensitive_anodized_aluminum
Verification stages of electronic designs that must pass before manufacture
like Intel used rubylith for the production of semiconductor lithography photomasks. Manually drawn circuit draft schematics of the semiconductor devices
Signoff (electronic design automation)
Signoff_(electronic_design_automation)
Versions of a processor of the same processor type
introduction or revision of one or more photolithographic photomasks within the set of photomasks that is used to pattern an integrated circuit. The term
Stepping_level
Process of calculating the causal factors that produced a set of observations
(DOA) estimation in signal processing. Inverse lithography is used in photomask design for semiconductor device fabrication. Four main academic journals
Inverse_problem
resist and irradiated with short-wavelength light projected through a photomask, which is a specially prepared stencil formed of opaque and transparent
Resist (semiconductor fabrication)
Resist_(semiconductor_fabrication)
Photolithographic technique
either topside or backside of the wafer. Magnetic masks are analogous to a photomask in photolithography, in that they define the spatial distribution and
Magnetolithography
Administrative centre and town in Scotland
companies specialised in this sector include Compugraphic which develops photomasks for the microelectronics sector, CTDI (formally Regenersis) which provides
Glenrothes
2006–2011 German computer memory manufacturer
Electronics Corporation, IBM, Altis, AMD (for ATI graphics products), Toppan Photomasks, Spansion, and Sandisk. Dresden, Germany Vila do Conde, Portugal. This
Qimonda
Task of creating a processor
Re-designing a CPU core to a smaller die area helps to shrink everything (a "photomask shrink"), resulting in the same number of transistors on a smaller die
Processor_design
Models replicating electronic behavior
circuit designs. In particular, for integrated circuits, the tooling (photomasks) is expensive, breadboards are impractical, and probing the behavior of
Electronic_circuit_simulation
4-bit microprocessor
"totally programmable", this programming had to be done by changing a photomask in the manufacturing process. It along with its 1974 successor, the TMS1000
Intel_4004
Ways in which length, distance or range can be measured
Postek (2005). "Photomask critical dimension metrology in the scanning electron microscope". In Syed Rizvi (ed.). Handbook of photomask manufacturing technology
Length_measurement
American ceramic manufacturing company
and Nagasaki, Japan Formerly Saint-Gobain. Japan HQ, quartz glass and photomask substrates. Gumi City, Korea CoorsTek Korea Kyungbook, Korea Formerly
CoorsTek
Town in South Wales
Aviation and home accessories manufacturer Dekor plc. The Semiconductor Photomask Company, Photronics Inc, has a manufacturing operation at the Ewenny Science
Bridgend
Former vice chancellor of LUMS
2017. "Sohail Naqvi". Simple CD measurement of periodic structures on photomasks, 1991-02-27, retrieved 2018-07-04 Hickman, K. C.; Gaspar, S. M.; Bishop
Syed_Sohail_Hussain_Naqvi
shut down e-beam tool operation, sources say". "Applied Materials exits photomask business". www.laserfocusworld.com. Archived from the original on 2018-04-07
Etec_Systems
Japanese company
wafers and other components. Lasertec also develops inspection systems for photomasks used in the production of flat-panel displays and laser microscopes. Lasertec
Lasertec
Concept in digital electronics
sometimes drastically The cost of these failures is very high, and includes photomask costs, engineering costs and opportunity cost due to delayed product introduction
Signal_integrity
Overview article
hexamethyldisilazane (HMDS), photoresist (positive or negative), spin coating, photomask, an exposure system and other various chemicals. By carefully manipulating
Chemistry_of_photolithography
conventional UV source, a contact stage, and a tilting stage. Plus, we place a photomask and a photoresist coated substrate between the upper and lower plates
3D_microfabrication
Very small devices that incorporate moving components
nanometer range. This form of maskless lithography has found wide usage in photomask-making used in photolithography, low-volume production of semiconductor
MEMS
8-bit microprocessor
using the then-current contact lithography process. In this process, the photomask is placed in direct contact with the wafer, exposed, and then lifted off
Motorola_6809
Used to create structures that only measure nanometers
high resolution and low throughput, limiting single-column e-beams to photomask fabrication, low-volume production of semiconductor devices, and research
Nanolithography
Japanese printing company
(president) Products IC tag, thermal transfer ribbons, smart card, shadow mask, photomask, building material Services Business service, commercial printing Revenue
Dai_Nippon_Printing
Engineering process for electronic hardware
tape out Reticle layout Layout-to-mask preparation Reticle fabrication Photomask fabrication Wafer fabrication Packaging Die test Post silicon validation
Integrated_circuit_design
Creating an integrated circuit by combining many transistors into a single chip
number of dies per wafer increases, and the complexity of making suitable photomasks goes up rapidly. A mask set for a modern technology can cost several million
Very-large-scale_integration
American chemicals production company
2025: MacDermid Incorporated in October 2013 the electronic chemicals and photomasks businesses of OM Group Inc. in October 2015 Alent plc in December 2015
Element_Solutions
Techniques that create structures using stamps
replicating structures using "elastomeric stamps, molds, and conformable photomasks". It is called "soft" because it uses elastomeric materials, most notably
Soft_lithography
American scientist and engineer
Development Summer Olympics in 2012. In 2025, at the 31st Symposium on Photomask and NGL Mask Technology, David Britz spoke as the keynote speaker for
David_Britz
Defunct US semiconductor consortion (1987-2015)
manufacturing. Advanced technology programs focus on EUV lithography including photomask blank and photoresist development, materials and emerging technologies
SEMATECH
Engineering concept
starting the process from the beginning will almost always require new photomasks for all layers, and each of the 20 or so masks in a modern semiconductor
Engineering_change_order
polymers, ceramics, and liquids. He has earned patents for phase shift photomasks, transparent fluoropolymers for pellicles, photoresists and immersion
Roger_H._French
Devices using beams of free electrons
holograms (CGH). Maskless electron lithography has found wide usage in photomask making for photolithography, low-volume production of semiconductor components
Electron-beam_technology
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